“The Chinese internet has been abuzz recently about news of a breakthrough by Chinese scientists developing an ultra-deep ultraviolet light source for photolithography — the key process for making semiconductors. The furor was exacerbated by claims that construction of a lithography machine factory is underway in Xiongan, near Beijing. As a science writer and academic, many people have asked me to validate this news. The principle of this new light source is indeed real, but it was only proposed back in 2010 — the technology is still in the proof-of-concept phase and is at least 15 to 20 years away from practical application. Bizarrely, the source of the recent excitement was a research paper published by Tsinghua University scientists more than two years ago. Why it suddenly caught the public eye is unclear. As for the claims regarding the Xiongan factory, they are mere exaggerations. In a nutshell: no country will be able to independently produce a lithography machine at the most advanced global standard for decades.”
“They are the most precise and intricate apparatus that humankind has ever crafted. Semiconductor sophistication is measured in nanometers, indicating the size of the transistors — the smaller they are the more can fit onto a chip. For instance, the recent launch of Huawei’s new Mate 60 Pro smartphone was met with much fanfare because of speculation that it boasts a 7 nanometer (nm) chip made by China’s very own Semiconductor Manufacturing International Corp. The Chinese scientists have supposedly created a new source for EUV light. Originally developed by a U.S. company, which has since been acquired by Netherlands-based ASML Holding NV, EUV machines can produce 7 nm, 5 nm or even finer chips. One notch below EUV is deep ultraviolet (DUV) light. Remarkably, the 7 nm Kirin 9000s chip in Huawei’s latest phone was produced using DUV, demonstrating the feasibility of etching 7 nm transistors with a 193 nm wavelength through a method known as multiple patterning.”
“Currently, only a handful of global players, including ASML, Japan’s Canon Inc. and Nikon Corp., and Taiwan Semiconductor Manufacturing Co. Ltd., have mastered DUV technology. These devices consist of three primary segments: the light source, the optical system, and the etching worktable. I’d argue that creating and using each of these components is as technically challenging as landing on the moon. After a 22-year odyssey of testing, optimization and upgrades, the first commercially viable EUV photolithography machine was finally launched in 2019. Currently, ASML is the only company that makes the machine. Moreover, the U.S. Department of Energy holds nearly all the core patents for the lithography machine. So, when the U.S. government decided to prohibit the sale of these lithography machines to China, ASML can’t resist. For China to produce lithography machines independently, it would need to achieve self-reliance across all three critical components.”
Congratulations NY CREATES on this significant achievement. Canada's Semiconductor Council is looking forward to an going collaboration towards an integrated N. America semiconductor supply chain. LaMar Hill Kate Alcott