EHT Semi

Stop by our booth this week to learn more about how Perseus can help improve ion energy control at the wafer surface. These bias waveforms can improve your etching quality. Come visit us at #6284 to learn more.

One week to go until we're in San Francisco talking talking about how EHT Semi power system can improve your plasma control to transform your semiconductor processing techniques.

In two weeks, we'll be showcasing our new wafer bias pulse generators at Semicon West. Stop by our booth to learn how EHT Semi power systems can improve your semiconductor process.

With internal voltage and current measurements, EHT Semi power systems can determine the wafer voltage in real time. The ion energy distribution (IED) can also rapidly be calculated. Unlike RF generators that can only use power as a control parameter, our bias waveform generators can use wafer voltage and/or IED to control the process. Learn more at https://lnkd.in/gABAqist

The EHT Semi research team is doing fantastic work that will pave the way to new tools for optimized plasma control for semiconductor manufacturing. Congrats...... #EHTSemi #precisionpulsedpower

EHT Semi was selected for a U.S. Department of Energy (DOE) SBIR Phase I, titled "Independent Electron and Ion Energy Distribution Control for Semiconductor Processing." In this program, we'll be measuring EEDs and IEDs with Perseus™. We're looking forward to sharing results during this research project that will help improve #semiconductormanufacturing.

Adjusting the wafer bias waveform for #semiconductor processing allows for control over the ion energy distribution. Other bias power systems offer a few states for multistate operation. EHT Semi's Perseus™ has a continuously-adjustable multistate capability, which enables the production of arbitrary ion energy distributions at the wafer surface. Learn more about multistate operation at https://lnkd.in/gzpVT5pg

Our power systems will be part of tools that will enable the manufacturing of the next generation #semiconductor chips. The give users direct control of the distribution of ion energies reaching the wafer surface. Contact our engineers to find out how: https://ehtsemi.com/

We have different pulse generator options for wafer bias for #semiconductor processing. Come checkout our tutorial on the relationship between waveforms and ion energy distribution. Our engineers can help you optimize the pulse generator for your process. https://lnkd.in/gKyTmJyk

It's exciting to see Princeton Plasma Physics Laboratory (PPPL) and their collaborators continue to advance the capabilities of their plasma modeling code, EDIPIC. Under our DOE SBIR to improve ion control for semiconductor processing, our collaborators at North Carolina State University are using EDIPIC to help us understand how the bias waveform impacts the plasma and ion energy distribution at the wafer surface.