Numerically controlled sacrificial plasma oxidation using array of electrodes for improving thickness uniformity of SOI
Y Sano, S Kamisaka, K Yoshinaga…�- …�SOI Conference (SOI�…, 2010 - ieeexplore.ieee.org
Y Sano, S Kamisaka, K Yoshinaga, H Mimura, S Matsuyama, K Yamauchi
2010 IEEE International SOI Conference (SOI), 2010•ieeexplore.ieee.orgAn array of electrodes covering one-sixth of the area of an 8" wafer was developed as a
prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system
can be used for simultaneous NC processes by the individual control of the plasma-on time
of each electrode.
prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system
can be used for simultaneous NC processes by the individual control of the plasma-on time
of each electrode.
An array of electrodes covering one-sixth of the area of an 8" wafer was developed as a prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system can be used for simultaneous NC processes by the individual control of the plasma-on time of each electrode.
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