Piotr Słupski

I've answered the following questions on Quora:
https://www.quora.com/What-is-dark-matter-8/answer/Piotr-S%C5%82upski What is Dark Matter
https://www.quora.com/When-does-Population-inversion-happen/answer/Piotr-S%C5%82upski When population inversion happens
https://www.quora.com/Is-dark-matter-a-sea-of-massive-photons-which-are-displaced-by-the-matter/answer/Piotr-S%C5%82upski Is dark matter a sea of massive… Pokaż więcej

I've answered the following questions on Quora:
https://www.quora.com/What-is-dark-matter-8/answer/Piotr-S%C5%82upski What is Dark Matter
https://www.quora.com/When-does-Population-inversion-happen/answer/Piotr-S%C5%82upski When population inversion happens
https://www.quora.com/Is-dark-matter-a-sea-of-massive-photons-which-are-displaced-by-the-matter/answer/Piotr-S%C5%82upski Is dark matter a sea of massive photons?
https://www.quora.com/If-photons-have-no-mass-how-are-they-able-to-bounce-off-things/answer/Piotr-S%C5%82upski If photons have no mass, how can they bounce off of things?
https://www.quora.com/Before-a-photon-makes-contact-with-matter-does-it-exist/answer/Piotr-S%C5%82upski Before a photon makes contact with matter, does it exist?
https://www.quora.com/Can-you-explain-Wheeler%E2%80%93Feynman-absorber-theory-in-laymans-terms/answer/Piotr-S%C5%82upski Can you explain Wheeler-Feynmann absorber theory in layman terms? Pokaż mniej

The cornerstone of the presentation was the description of the vircator, aswell as the laid out physical principles of operation. The vircator (virtual cathode oscillator) is a high power vacuum microwave device that may be used as an electromagnetic pulse generator.

Characterization of size of synthesized semiconductor copper indium sulfide (CuInS2) nanoparticles used for doping liquid crystal E7 is presented. The method of production of uniform dispersions of the nanoparticles in liquid crystals avoiding aggregation of the nanoparticles is discussed. It was possible to prepare doped liquid crystal with almost uniform dispersion of nanoparticles in the cell, which are visible as defects in homogenous liquid crystal phase. Electrorefractive and… Pokaż więcej

Characterization of size of synthesized semiconductor copper indium sulfide (CuInS2) nanoparticles used for doping liquid crystal E7 is presented. The method of production of uniform dispersions of the nanoparticles in liquid crystals avoiding aggregation of the nanoparticles is discussed. It was possible to prepare doped liquid crystal with almost uniform dispersion of nanoparticles in the cell, which are visible as defects in homogenous liquid crystal phase. Electrorefractive and photo-electrorefractive characterizations of the mixtures have been done with pure E7 sample as a reference and the results are discussed. Lead author Maciej Czajkowski. Pokaż mniej

oft lithography and UV-NIL are important technologies for micro- and nano- structures replication [1]. It is possible to adapt surface structures preparation for many applications regarding e.g. opto-fluidic on-chip microscopy, wetting or reflection properties [2]. Light microscopy has been one of the most common tools in biological research, because of its high resolution and non-invasive nature of the light. Fresnel lens can be used in passive and active high quality polymer-based on-chip… Pokaż więcej

oft lithography and UV-NIL are important technologies for micro- and nano- structures replication [1]. It is possible to adapt surface structures preparation for many applications regarding e.g. opto-fluidic on-chip microscopy, wetting or reflection properties [2]. Light microscopy has been one of the most common tools in biological research, because of its high resolution and non-invasive nature of the light. Fresnel lens can be used in passive and active high quality polymer-based on-chip components for integrated photonics circuits [3]. In presented soft lithography technique the various materials were used for Fresnel lens replication: PDMS, h-PDMS and thiol-ene-epoxy resin. Mentioned polymers are characterized by high flexibility and transparency with minimal color. The silicon matrices replication process involves two main steps: anti-adhesive layer preparation and polymer deposition. The influence of structures geometry on the optical properties Fresnel lens has been investigated. The topography of obtained replicas was characterized using the atomic force microscopy (AFM) and scanning electron microscopy (SEM). The efficiency of light focus of the selected wavelength has been checked by intensity measurement using a standard optical microscope. As a result of replication 10□m diameter Fresnel lenses have been prepared. Pokaż mniej

In this work the construction of experimental setup for MEMS/NEMS deflection measurements is presented. The system is based on intensity fibre optic detector for linear displacement sensing. Furthermore the electronic devices: current source for driving the light source and photodetector with wide-band preamplifier are presented.

Lead Author: Grzegorz Jóźwiak

Student publication

Publication is being processed

Publication is being processed

Photolighographic processes of multilevel features in microfluidics can be very complex and expensive. This paper demonstrates a new, quick method for manufacturing multilevel patterns which is based on Liquid Crystal Display masking during a standard lithography process for master mold fabrication for the PDMS replica process. An active mask, based on a liquid crystal display can simplify the process, thanks to the ability to quickly modify designs and reduce the overhead for alignment… Pokaż więcej

Photolighographic processes of multilevel features in microfluidics can be very complex and expensive. This paper demonstrates a new, quick method for manufacturing multilevel patterns which is based on Liquid Crystal Display masking during a standard lithography process for master mold fabrication for the PDMS replica process. An active mask, based on a liquid crystal display can simplify the process, thanks to the ability to quickly modify designs and reduce the overhead for alignment between mask levels. The possibility of multilevel patterning, with the help of active masking, creates new opportunities for optical lithography processes. We have developed the process for a standard, mercury lamp exposure mask aligner system. The patterning characteristics were evaluated, with a step pattern fabricated as an example of 3D patterning for multilevel structuring. The application of an LC mask for resist contrast measurements was demonstrated Pokaż mniej

Publication is being processed

Lead Author : dr Tomasz Piasecki

Micro- and Electro-Mechanical Systems (MEMS) form a group of transducers used for very precise mass sensing (in the range of femtograms) and force detection (in the range of piconewtons) changes. These can be read by the resonant frequency shift or amplitude of mechanical vibration changes. Monitoring of optical path is one of the ways in which this detection can occur. The use of fibre construction makes the read-out system even more attractive. There are two popular types of Fibre Optics… Pokaż więcej

Micro- and Electro-Mechanical Systems (MEMS) form a group of transducers used for very precise mass sensing (in the range of femtograms) and force detection (in the range of piconewtons) changes. These can be read by the resonant frequency shift or amplitude of mechanical vibration changes. Monitoring of optical path is one of the ways in which this detection can occur. The use of fibre construction makes the read-out system even more attractive. There are two popular types of Fibre Optics Displacement Sensors (FODS). The first – with amplitude of optical wave modulation – intensity sensors. The second – with phase modulation – fibre optics interferometers.

In this paper Intensity Fibre Optic Displacement Sensor (I-FODS) for MEMS displacement metrology has been presented. A system formed by simple optical fibre optics, light source and photodetector had been tested and evaluated in order to obtain the highest possible sensitivity and resolution, using low-cost standard telecommunications equipment. The sensor׳s system is dedicated to MEMS amplitude of vibrations metrology and allows displacement monitoring in the range up to 400 μm with the resolution of 15 nm and the sensitivity of 0.19 V/nm for a mirror reflecting surface. The paper shows Quartz Tuning Fork (QTF) as an example of the MEMS with a very rough surface and its resonance frequency is equal to about 32 kHz. The designed I-FODS allows the QTF amplitude measurements with the resolution of 92 nm and the sensitivity of 0.017 mV/nm. Pokaż mniej