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Surface metallization of PTFE and PTFE composites by ion implantation for low-background electronic substrates in rare-event detection experiments

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Abstract

Polytetrafluoroethylene (PTFE) is a low-background polymer that is applied to several applications in rare-event detection and underground low-background experiments. PTFE-based electronic substrates are important for reducing the detection limit of high-purity germanium detectors and scintillator calorimeters, which are widely applied in dark matter and 0υββ detection experiments. The traditional adhesive bonding method between PTFE and copper is not conducive to working in liquid nitrogen and extremely low-temperature environments. To avoid adhesive bonding, PTFE must be processed for surface metallization owing to the mismatch between the PTFE and copper conductive layer. Low-background PTFE matrix composites (m-PTFE) were selected to improve the electrical and mechanical properties of PTFE by introducing SiO2/TiO2 particles. The microstructures, surface elements, and electrical properties of PTFE and m-PTFE were characterized and analyzed following ion implantation. PTFE and m-PTFE surfaces were found to be broken, degraded, and cross-linked by ion implantation, resulting in C=C conjugated double bonds, increased surface energy, and increased surface roughness. Comparably, the surface roughness, bond strength, and conjugated double bonds of m-PTFE were significantly more intense than those of PTFE. Moreover, the interface bonding theory between PTFE and the metal copper foil was analyzed using the direct metallization principle. Therefore, the peel strength of the optimized electronic substrates was higher than that of the industrial standard at extremely low temperatures, while maintaining excellent electrical properties.

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Acknowledgements

In addition, the authors are thankful for the valuable suggestions provided by the open fund of the Key Laboratory of Particle Technology and Radiation Imaging (Ministry of Education) at Tsinghua University, members of the China Dark Matter EXperiment Cooperation Group.

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Authors and Affiliations

  1. College of Nuclear Science and Technology, Beijing Normal University, Joint Laboratory of Jinping Ultra-low Radiation Background Measurement of Ministry of Ecology and Environment Beijing Normal University, Key Laboratory of Beam Technology of Ministry of Education, Beijing Normal University, Beijing, 100875, China

    Shao-Jun Zhang, Yuan-Yuan Liu, Sha-Sha Lv, Jian-Ping Cheng & Bin Liao

  2. Beijing Radiation Center, Beijing, 100875, China

    Pan Pang

  3. Department of Engineering Physics, Key Laboratory of Particle and Radiation Imaging of Ministry of Education, Tsinghua University, Beijing, 100084, China

    Zhi Deng

  4. Joint Research Center, Nuctech Company Limited, Beijing, 100084, China

    Li He

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  1. Shao-Jun Zhang
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Contributions

The authors of Yuan-Yuan Liu, Sha-Sha Lv, Jian-Ping Cheng and Bin Liao contributed to low-background polymers screening, the conception and design of the study. The experiment was performed and analyzed by Shao-Jun Zhang and Pan Pang. Dielectric properties analyses were performed by Zhi Deng and Li He. The original draft of the manuscript was written by Shao-Jun Zhang, and all the authors have reviewed and commented on the manuscript.

Corresponding authors

Correspondence to Yuan-Yuan Liu or Sha-Sha Lv.

Additional information

This work was supported by the National Natural Science Foundation of China (Nos. 12141502 and 12005017).

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Zhang, SJ., Liu, YY., Lv, SS. et al. Surface metallization of PTFE and PTFE composites by ion implantation for low-background electronic substrates in rare-event detection experiments. NUCL SCI TECH 33, 90 (2022). https://doi.org/10.1007/s41365-022-01068-0

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