Abstract
The focused ion beam (FIB) technology has become increasingly popular fabrication and characterization tool across many research areas from nanotechnology, material science, microelectronic industry, life science, biology, and medicine. FIB was specially recognized as an attractive tool or the fabrication of micro- and nanostructures with complex geometries and shapes. This chapter presents the basic introduction of FIB dual-beam system and its operation modes, followed by description of instrument in more details. The review has emphasis on FIB fabrication of nanostructures by milling and deposition methods with particular focus on fabrication of nanopatterns and nanopore arrays. Various efforts to fabricate micro- and nanoscale structure and geometrically complex structure are described. Finally, recent developments of applications of FIB in different areas of material science and life science are briefly reviewed.
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References
Melngailis, J.: Focused ion beam technology and applications. J. Vac. Sci. Technol. B 5(2), 469–495 (1987)
Stewart, D., Doyle, K., Andrew, F., Casey, Jr. J., David: Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for X-ray mask repair. In: Proc. SPIE. vol. 276, pp. 276–283. (1995)
Smidt, F.A., Hubler, G.K.: Recent advances in ion beam modification of metals. Nucl. Instr. Meth. Phys. Res. B80/81 1, 207–216 (1993)
Reyntjens, S., De Bruyker, D., Puers, R.: Focused ion beam as an inspection tool for microsystem technology. In: Proc. Microsystem Symp. p. 125. Delft, The Netherlands (1998)
Ward, B.W., Economou, N.P., Shaver, D.C., Ivory, J.E., Ward, M.L., Stern, L.A.: Microcircuit modification using focused ion beams. In: Proc. SPIE. p. 923. (1988)
Glanville, J.: Focused ion beam technology for integrated circuit modification. Solid State Tech. 32, 270 (1989)
Stewart, D.K., Stern, L.A., Foss, G., Hughes, G., Govil, P.: Focused ion beam induced tungsten deposition for repair of clear defects on X-ray masks. In: Proc. SPIE. p. 1263. (1990)
Walker, J.F., Reiner, J.C., Solenthaler, C.: Focused ion beam sample preparation for TEM. Proc. Microscop Semiconductor Material Conf., Oxford (1995)
Athas, G.J., Noll, K.E., Mello, R., Hill, R., Yansen, D., Wenners, F.F., Nadeau, J.P., Ngo, T., Siebers, M.: Focused ion beam system for automated MEMS prototyping and processing. In: Proc. SPIE, vol. 3223, p. 198. (1997)
Daniel, J.H., Moore, D.F.: A microaccelerometer structure fabricated in silicon-on-insulator using a focused ion beam process. Sens. Actuator A Phys. 73(3), 201–209 (1999)
Brugger, J., Beljakovic, G., Despont, M., de Rooij, N.F., Vettiger, P.: Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching. Microelectron. Eng. 35(1–4), 401–404 (1997)
Giannuzzi, Lucille, A., Stevie, F.A.: Introduction to focused ion beams: Instrumentation, theory, techniques, and practice. New York: Springer (2005)
Volkert, C., Minor, A.: Focused ion beam microscopy and micromachining. Mrs Bull 32(5), 389–395 (2007)
Reyntjens, S., Puers, R.: A review of focused ion beam applications in microsystem technology. J. Micromech. Microeng. 11(287), 300 (2001)
Thornell, G., Johansson, S.: Microprocessing at the fingertips. J. Micromech. Microeng. 8, 251 (1998)
Johansson, S., Schweitz, J.A., Westberg, H., Boman, M.: Microfabrication of three-dimensional boron structures by laser chemical processing. J. Appl. Phys. 72, 5956 (1992)
Gierak, J.: Focused ion beam technology and ultimate applications. Semicond. Sci. Tech. 24, 23 (2009)
Kim, C.S., Ahn, S.H., Jang, D.Y.: Review: developments in micro/nanoscale fabrication by focused ion beams. Vacuum 86(8), 1014–1035 (2012)
Urbanek, M., Uhlíř, V., Bábor, P., Kolíbalová, E., Hrnič́ř, T., Spousta, J., Šikola, T.: Focused ion beam fabrication of spintronic nanostructures: an optimization of the milling process. Nanotechnology 21, 145305 (2010)
Storm, A.J., Chen, J.H., Ling, X.S., Zandbergen, H.W., Dekker, C.: Fabrication of solid-state nanopores with single-nanometre precision. Nat. Mater. 2(8), 537–540 (2003)
Chang, H., Iqbal, S.M., Stach, E.A., King, A.H., Zaluzec, N.J., Bashir, R.: Fabrication and characterization of solid-state nanopores using a field emission scanning electron microscope. Appl. Phys. Lett. 88 (2006)
Wu, M., Krapf, D., Zandbergen, M., Zandbergen, H.W., Batson, P.E.: Formation of nanopores in a SiN/SiO2 membrane with an electron beam. Appl. Phys. Lett. 87, 113106-1–113106-3 (2005)
Apel, P.Y., Akimenko, A., Blonskaya, I., Cornelius, T., Neumann, R., Schwartz, K., Spohr, R., Trautmann, C.: Etching of nanopores in polycarbonate irradiated with swift heavy ions at 15K. Nucl. Instrum. Methods Phys. Res., Sect. B: Beam Interactions with Materials and Atoms 245(1), 284–287 (2006)
Fu, Y.B., Ngoi, K., Ann, F., Loh, T.: Fabrication and characterization of nanopore array. J. Nanosci. Nanotechnol. 6(7), 1954–1960 (2006)
Li, J., Stein, D., McMullan, C., Branton, D., Aziz, M.J., Golovchenko, J.A.: Ion-beam sculpting at nanometre length scales. Nature 412(6843), 166–169 (2001)
Kim, M.J., Wanunu, M., Bell, D.C., Meller, A.: Rapid fabrication of uniformly sized nanopores and nanopore arrays for parallel DNA analysis. Adv. Mater. 18(23), 3149–3153 (2006)
Lanyon, Y.H., De Marzi, G., Watson, Y.E., Quinn, A.J., Gleeson, J.P., Redmond, G., Arrigan, D.W.M.: Fabrication of nanopore array electrodes by focused ion beam milling. Anal. Chem. 79(8), 3048–3055 (2007)
Langford, R.M.: Focused ion beam nanofabrication: a comparison with conventional processing techniques. J. Nanosci. Nanotechnol. 6(3), 661–668 (2006)
Wei, H.-X., Langford, R.M., Han, X., Coey, J.M.D.: Controlled fabrication of nickel perpendicular nanocontacts using focused ion beam milling. J. Appl. Phys. 99(8), 8C501–8C503 (2006)
Ch Santschi, M.J., Hoffmann, P., Brugger, J.: Interdigitated 50 nm Ti electrode arrays fabricated using XeF2 enhanced focused ion beam etching. Nanotechnology 17, 2722 (2006)
McNally, B., Singer, A., Yu, Z., Sun, Y., Weng, Z., Meller, A.: Optical recognition of converted DNA nucleotides for single-molecule DNA sequencing using nanopore arrays. Nano Lett. 10(6), 2237–2244 (2010)
Kwon, N., Kim, K., Heo, J., Chung, I.: Fabrication of ordered anodic aluminum oxide with matrix arrays of pores using nanoimprint. In: AVS, pp. 803–807. (2009)
Shingubara, S., Maruo, S., Yamashita, T., Nakao, M., Shimizu, T.: Reduction of pitch of nanohole array by self-organizing anodic oxidation after nanoimprinting. Microelectron. Eng. 87(5–8), 1451–1454 (2010)
Choi, J., Wehrspohn, R.B., Gösele, U.: Mechanism of guided self-organization producing quasi-monodomain porous alumina. Electrochim. Acta 50(13), 2591–2595 (2005)
Liu, C.Y., Datta, A., Wang, Y.L.: Ordered anodic alumina nanochannels on focused-ion-beam-prepatterned aluminum surfaces. Appl. Phys. Lett. 78(1), 120–122 (2001)
Bo Chen, K.L., Zhipeng, T.: Understanding focused ion beam guided anodic alumina nanopore development. Electrochim. Acta 56, 9802–9807 (2011)
Chen, B., Lu, K., Tian, Z.: Novel patterns by focused ion beam guided anodization. Langmuir 27(2), 800–808 (2010)
Lillo, M., Losic, D.: Ion-beam pore opening of porous anodic alumina: the formation of single nanopore and nanopore arrays. Mater. Lett. 63(3–4), 457–460 (2009)
Miller, M.K., Russell, K.F., Thompson, K., Alvis, R., Larson, D.J.: Review of atom probe FIB-based specimen preparation methods. Microsc. Microanal. 13(6), 428–436 (2007)
Larson, D.J., Foord, D.T., Petford-Long, A.K., Anthony, T.C., Rozdilsky, I.M., Cerezo, A., Smith, G.W.D.: Focused ion-beam milling for field-ion specimen preparation: preliminary investigations. Ultramicroscopy 75(3), 147–159 (1998)
Miller, M.K., Russell, K.F.: FIB-based atom probe specimen preparation of powders. Microsc. Microanal. 12, 1294–1295 (2006)
Vasile, M.J., Grigg, D., Griffith, J.E., Fitzgerald, E., Russell, P.E.: Scanning probe tip geometry optimized for metrology by focused ion beam ion milling. J. Vac. Sci. Tech. B 9(6), 3569–3572 (1991)
Matsui, S., Kaito, T., Fujita, J.-i., Komuro, M., Kanda, K., Haruyama, Y.: Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition. J. Vac. Sci. Technol. B: Microelectron Nanomet, 18(6), 3181–3184 (2000)
Fujita, J., Ishida, M., Ichihashi, T., Ochiai, Y., Kaito, T., Matsui, S.: Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties. Nucl. Instrum. Methods Phys. Res., Sect. B 206, 472–477 (2003)
Fujita, J., Ishida, M., Sakamoto, T., Ochiai, Y., Kaito, T., Matsui, S.: Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition. J. Vac. Sci. Technol. B, 19(6), 2834–2837 (2001)
Kim, Y.K., Danner, A.J., Raftery, J.J., Choquette, K.D.: Focused ion beam nanopatterning for optoelectronic device fabrication. IEEE J. Quant. Electron. 11(6), 1292–1298 (2005)
Nordseth, O., Kjellman, J.O., You, C.C., Royset, A., Tybell, T., Grepstad, J.K.: The case for electro-optic waveguide devices from ferroelectric (Pb,La) (Zr,Ti)O3 thin film epilayers. In: SPIE China pp. 73810F. (2009)
Steckl, A.J.: Exploring the frontiers of optoelectronics with FIB technology. In: Frontiers in Electronics, Advanced Workshop. pp. 47–50. (1997)
Wirth, R.: Focused ion beam (FIB): a novel technology for advanced application of micro- and nanoanalysis in geosciences and applied mineralogy. Eur. J. Mineral. 16(6), 863–876 (2004)
Lemmens, H., Butcher, A., Richards, D., Laughrey, C., Dixon, M.: Imaging techniques for 2D and 3D characterization of unconventional reservoirs core and cuttings samples; and how to integrate them. Society of Petroleum Engineers—SPE Americas Unconventional Gas Conference. vol. 1, pp. 555–557. (2011)
Lemmens, H.J., Butcher, A.R., Botha, P.W.S.K.: FIB/SEM and automated mineralogy for core and cuttings analysis. Society of Petroleum Engineers—SPE Russian Oil and Gas Technical Conference and Exhibition. vol. 2, pp. 881–884. (2010)
Heaney, P.J., Vicenzi, E.P., Giannuzzi, L.A., Livi, K.J.T.: Focused ion beam milling: a method of site-specific sample extraction for microanalysis of earth and planetary materials. Am. Mineral. 86(9), 1094–1099 (2001)
Sivel, V.G.M., Van Den Brand, J., Wang, W.R., Mohdadi, H., Tichelaar, F.D., Alkemade, P.F.A., Zandbergen, H.W.: Application of the dual-beam FIB/SEM to metals research. J. Microsc. 214(3), 237–245 (2004)
Xhoffer, C., Dhont, A., Willems, A.: The use of focused ion beam in metal research. Yejin Fenxi/Metallurg. Anal. 32(7), 7–11 (2012)
Mathew, J.V., Bhattacharjee, S.: Multi-element focused ion beams using compact microwave plasma ion source. Indian J. Phys. 85(12), 1863–1870 (2011)
Schulz, R.: Focused ion beam (FIB)—applications as a research tool in surface finishing. Focused ion beam (FIB). Galvanotechnik 102(10), 2174–2181 (2011)
Schindler, G., Klandzevski, V., Steinlesberger, G., Steinhögl, W., Traving, M., Engelhardt, M.A.: Morphology study of copper and aluminum interconnects. Advanced Metallization Conference. pp. 213–217. (2003)
Shinji, M., Yukinori, O.: Focused ion beam applications to solid state devices. Nanotechnology 7, 247 (1996)
Nan, L.K., Lung, L.M.: TEM sample preparation by single-sided low-energy ion beam etching. 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA (2012)
Oh, J., Kim, J., Lee, J., Kim, J., Back, T., Kim, W., Kim, H., Kim, C.: Evaluation of electrical properties of cell area on the semiconductor devices by FIB technique. 37th International Symposium for Testing and Failure Analysis, ISTFA. pp. 443–445. (2011)
Dhara, S., Lu, C.Y., Wu, C.T., Hsu, C.W., Tu, W.S., Chen, K.H., Wang, Y.L., Chen, L.C., Raj, B.: Focused ion beam induced nanojunction and defect doping as a building block for nanoscale electronics in GaN nanowires. J. Phys. Chem. C 114(36), 15260–15265 (2010)
Kasianowicz, J.J.B.E., Branton, D., Deamer, D.W.: Characterization of individual polynucleotide molecules using a membrane channel. Proc. Natl. Acad. Sci. 93, 13770–13773 (1996)
Mathé, J.A.A., Nelson, D.R., Schulten, K., Meller, A.: Orientation discrimination of single stranded DNA inside the α-Hemolysin membrane channel. Proc. Natl. Acad. Sci. 102, 12377–12382 (2005)
Terada, D., Hattori, S., Honda, T., Iitake, M., Kobayashi, H.: Embossed-carving processing of cytoskeletons of cultured cells by using focused ion beam technology. Microsc. Res. Tech. 76(3), 290 (2013)
Grandfield, K., Engqvist, H.: Focused ion beam in the study of biomaterials and biological matter. Adv. Mater. Sci. Eng. 6, 841961 (2012)
Schertel, A., Kraft, D., Rauscher, M.: Applications of SEM/FIB technology in life science. Microsc. Microanal. 15(2), 344–345 (2009)
Yamazaki, A., Morita, Y., Kim, Y., Owari, M.: Cross-section analysis of a laminated film by dual FIB ToF-SIMS. E. J. Surfac. Sci. Nanotechnol. 9, 426–429 (2011)
Sezen, M., Plank, H., Fisslthaler, E., Chernev, B., Zankel, A., Tchernychova, E., Blümel, A., List, E.J.W., Grogger, W., Pölt, P.: An investigation on focused electron/ion beam induced degradation mechanisms of conjugated polymers. Phys. Chem. Chem. Phys. 13(45), 20235–20240 (2011)
Mariam, A.A.I., Jongin, H., Phillip, K., Emanuele, I., Joshua, B.E., Tim, A.: Precise electrochemical fabrication of sub-20 nm solid-state nanopores for single-molecule biosensing. J. Phys. Condens. Matter 22, 454128 (2010)
Mulero, R., Prabhu, A.S., Freedman, K.J., Kim, M.J.: Nanopore-based devices for bioanalytical applications. JALA 15(3), 243–252 (2010)
Ayub, M., Ivanov, A., Hong, J., Kuhn, P., Instuli, E., Edel, J.B., Albrecht, T.: Precise electrochemical fabrication of sub-20 nm solid-state nanopores for single-molecule biosensing. J. Phys. Condens. Matter 22(45) (2010)
Stevie, F.A., Irwin, R.B., Shofner, T.L., Brown, S.R., Drown, J.L., Giannuzzi, L.A.: Plan view TEM sample preparation using the focused ion beam lift-out technique. In: AIP Conf. Proc. p. 868. (1998)
Gnauck, P., Hoffrogge, P.A.: New SEM/FIB crossbeam inspection tool for high resolution materials and device characterization. In: Proc. SPIE. pp. 106–113. (2003)
Proff, C., Abolhassani, S., Dadras, M.M., Lemaignan, C.: In situ oxidation of zirconium binary alloys by environmental SEM and analysis by AFM, FIB, and TEM. J. Nucl. Mater. 404(2), 97–108 (2010)
Nam, C.Y., Kim, J.Y., Fischer, J.E.: Focused-ion-beam platinum nanopatterning for GaN nanowires: ohmic contacts and patterned growth. Appl. Phys. Lett. 86(19), 193112–193113 (2005)
Guo, D., Kometani, R., Warisawa, S.i., Ishihara, S.: Three-Dimensional nanostructure fabrication by controlling downward growth on focused-ion-beam chemical vapour deposition. Jpn. J. Appl. Phys. 51(6), 5001 (2012)
Ke, J.J., Tsai, K.T., Dai, Y.A., He, J.H.: Contact transport of focused ion beam-deposited Pt to Si nanowires: from measurement to understanding. Appl. Phys. Lett. 5, 100 (2012)
Naik, J.P., Prewett, P.D., Das, K., Raychaudhuri, A.K.: Instabilities in focused ion beam-patterned Au nanowires. Microelectron. Eng. 88(9), 2840–2843 (2011)
Acknowledgments
The authors acknowledge the financial support of the Australian Research Council (FT 110100711, LP 100100272) and the University of Adelaide for this work. The author also thanks Mr. L. Green from Adelaide Microscopy and FEI Company for technical and FIB imaging support.
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Kant, K., Losic, D. (2013). Focused Ion Beam (FIB) Technology for Micro- and Nanoscale Fabrications. In: Wang, Z. (eds) FIB Nanostructures. Lecture Notes in Nanoscale Science and Technology, vol 20. Springer, Cham. https://doi.org/10.1007/978-3-319-02874-3_1
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