Analysis of reflection high-energy electron-diffraction data from reconstructed semiconductor surfaces

B. A. Joyce, J. H. Neave, P. J. Dobson, and P. K. Larsen
Phys. Rev. B 29, 814 – Published 15 January 1984
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Abstract

Features in reflection high-energy electron-diffraction patterns arising from various types of surface disorder are discussed, with specific examples of each. The relationship between (001)2×4 and (001)c(2×8) reconstructions, which are frequently observed on III-V compound semiconductor surfaces, is explicitly demonstrated.

  • Received 20 July 1983

DOI:https://doi.org/10.1103/PhysRevB.29.814

©1984 American Physical Society

Authors & Affiliations

B. A. Joyce and J. H. Neave

  • Philips Research Laboratories, Redhill, Surrey RH1 5HA, United Kingdom

P. J. Dobson

  • Department of Physics, Imperial College of Science and Technology, Prince Consort Road, London SW72AZ, United Kingdom

P. K. Larsen

  • Philips Research Laboratories, 5600-MD Eindhoven, The Netherlands

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Vol. 29, Iss. 2 — 15 January 1984

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